M. R. Fadavieslam , N. Shahtahmasebi , M. Rezaee-Roknabadi , M. M. Bagheri-Mohagheghi
Journal of Semiconductors - 31, 11, 113002 - November, 2011 - .
Publication year: 2011

Abstract:

Tin sulfide thin films (SnxSy/ with an atomic ratio of y=x D0.5 have been deposited on a glass substrate
by spray pyrolysis. The effects of deposition parameters, such as spray solution rate (R), substrate temperature
(Ts/ and film thickness (t ), on the structural, optical, thermo-electrical and photoconductivity related properties
of the films have been studied. The precursor solution was prepared by dissolving tin chloride (SnCl4, 5H2O)
and thiourea in propanol, and SnxSy thin film was prepared with a mole ratio of y=x D 0.5. The prepared films
were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and UV-vis spectroscopy.
It is indicated that the XRD patterns of SnxSy films have amorphous and polycrystalline structures and the size
of the grains has been changed from 7 to 16 nm. The optical gap of SnxSy thin films is determined to be about
2.41 to 3.08 eV by a plot of the variation of (h/2 versus h related to the change of deposition conditions. The
thermoelectric and photo-conductivity measurement results for the films show that these properties are depend
considerably on the deposition parameters.